CMP/Display > CMP > Product Introduction
 
 
 
System Configuration
Dimensions 2300 x 3875 x 2800 (W x L x H)
Footprint
8.91§³ Weight 9.8 ton
Applicable Thin Film oxidized and metal thin films
Throughput (parallel) 70ea
Motor Current EPD System
In-line Metrology System
Sweep type Pad Conditioner
Full system monitoring and interlock
Exclusively for the 1st step grinding
Grinding Process
Specifications
-Grinding speed ¡Ã 3000 A/min (TEOS. W)
-Grinding Uniformity ¡Â 4.0%(1¥ò)
-Grinding Reproducibility ¡Â 2.0%(1¥ò)
-Pollutant Particle¡Â50ea(Supplier-1 6420,@0.16§­
-Scratch ¡Â 5 ea.(AIT)
 
 
System Configuration
Dimensions 2300 x 4650 x 2800 (W x L x H)
Footprint
11.0§³ Weight 11 ton
Applicable Thin Film oxidized and metal thin films
Throughput(2 min polish) 73ea
Motor Current EPD System
In-line Metrology System
Sweep type Pad Conditioner
Full system monitoring and interlock
For 2nd or 4th step grinding
Grinding Process
Specifications
-Grinding speed ¡Ã 3000 A/min (TEOS. W)
-Grinding Uniformity ¡Â 4.0%(1¥ò)
-Grinding Reproducibility ¡Â 2.0%(1¥ò)
-Pollutant Particle ¡Â 50ea(SP-1, @0.16§­
-Scratch ¡Â 5 ea.(AIT)